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17 March 2023 Towards improving projection two-photon lithography for 3D nanoprinting
Paul Somers, Jason E Johnson, Zihao Liang, Gavin Noel, Bryan W Boudouris, Liang Pan, Xianfan Xu
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Proceedings Volume PC12412, Laser 3D Manufacturing X; PC1241207 (2023) https://doi.org/10.1117/12.2648332
Event: SPIE LASE, 2023, San Francisco, California, United States
Abstract
In recent years there have been notable efforts to make two-photon lithography more efficient and faster while avoiding trade-offs in resolution and print quality. The projection two-photon printing scheme achieves high-throughput while maintaining useful feature sizes. However, due to limitations of the temporal focusing process implemented, as well as photoresist kinetics, the resolution of this process does not yet reach that of single focus scanning two-photon lithography. This work explores the photoresist systems used for projection printing and the effect of additional optical beams for enhancing the printing capabilities of two-photon projection printing.
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Paul Somers, Jason E Johnson, Zihao Liang, Gavin Noel, Bryan W Boudouris, Liang Pan, and Xianfan Xu "Towards improving projection two-photon lithography for 3D nanoprinting", Proc. SPIE PC12412, Laser 3D Manufacturing X, PC1241207 (17 March 2023); https://doi.org/10.1117/12.2648332
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KEYWORDS
Lithography
3D printing
Printing
Photoresist materials
Polymerization
Polymers
Resolution enhancement technologies
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