Paper
21 February 2013 High-performance broadband plasmonic absorber in visible fabricated by nanoimprint lithography
Author Affiliations +
Abstract
We demonstrate a nanostructured broadband absorber in visible range. Two kinds of structures with different absorption ranges are designed and fabricated using nanoimprint lithography. Experiments show a flat absorption spectra with an average absorption of 85% from 400 nm to 700 nm. The proposed structures could be used in the applications of thin-film thermal emitters and photovoltaic devices.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peng Zhu and L. Jay Guo "High-performance broadband plasmonic absorber in visible fabricated by nanoimprint lithography", Proc. SPIE 8632, Photonic and Phononic Properties of Engineered Nanostructures III, 86321A (21 February 2013); https://doi.org/10.1117/12.2004131
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Absorption

Copper

Nanoimprint lithography

Dispersion

Visible radiation

Magnetism

Plasmonics

Back to Top