Imaging optics setup and optimization on scanner for SMO generation process

Tomoyuki Matsuyama; Taro Ogata; Yasushi Mizuno; Yasuhiro Ohmura

doi:10.1117/12.916588

13 March 2012 Imaging optics setup and optimization on scanner for SMO generation process

Tomoyuki Matsuyama, Taro Ogata, Yasushi Mizuno, Yasuhiro Ohmura

Proceedings Volume 8326, Optical Microlithography XXV; 83260N (2012) https://doi.org/10.1117/12.916588
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Source & Mask Optimization1 (SMO) is a promising candidate to realize further reduction of k1 factor to achieve 22nm feature lithography and beyond. To make the SMO solutions feasible all imaging-related parameters should be closer to the designed parameters used in SMO process. In this paper, we discuss how we realize this in the imaging system setup on the scanner. The setup process includes freeform pupilgram generation, pupilgram adjustment and thermal aberration control. For each step the important factors are speed and accuracy.

Citation Download Citation

Tomoyuki Matsuyama, Taro Ogata, Yasushi Mizuno, and Yasuhiro Ohmura "Imaging optics setup and optimization on scanner for SMO generation process", Proc. SPIE 8326, Optical Microlithography XXV, 83260N (13 March 2012); https://doi.org/10.1117/12.916588

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