Synthesize and polymerization of novel photocurable vinyl ether monomers containing perfluorinated aromatic units

Wei Li; Ying Quan Zou

doi:10.1117/12.916674

19 March 2012 Synthesize and polymerization of novel photocurable vinyl ether monomers containing perfluorinated aromatic units

Wei Li, Ying Quan Zou

Author Affiliations +

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83251V (2012) https://doi.org/10.1117/12.916674
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

A series of novel UV-curable vinyl ether monomers with perfluorinated aromatic units for photoresist had been designed and synthesized. Perfluorinated vinyl ether monomer I-1was prepared from the reactions of 2-vinyloxy ethanol and hexafluorobenzene in the presence of sodium hydride in DMF. And perfluorinated vinyl ether monomer I-2 was prepared from the reactions of I-1 and 2,2,2-trifluoroethanol in the presence of sodium carbonate in DMF. The photocrosslinked perfluorinated polymers obtained by PAG201 (a kind of cationic photo-initiator) initiating. When PAG201 was introduced into the monomers, the conversion of vinyl ether double bond increased sharply. The final conversion was close to 90%, and when the light intensity was 478μW/cm², at 25 sec, the polymerization achieved maximum. Generally, the UV-curing performance of monomers with 3wt.% PAG201 concentration is superior to 2wt.% PAG201 concentration. And their physical and chemical properties satisfied the material requirements for photoresist or UV imaging materials.

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Wei Li and Ying Quan Zou "Synthesize and polymerization of novel photocurable vinyl ether monomers containing perfluorinated aromatic units", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251V (19 March 2012); https://doi.org/10.1117/12.916674

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