Scalable simulations for directed self-assembly patterning with the use of GPU parallel computing

Kenji Yoshimoto; Brandon L. Peters; Gurdaman S. Khaira; Juan J. de Pablo

doi:10.1117/12.917830

21 March 2012 Scalable simulations for directed self-assembly patterning with the use of GPU parallel computing

Kenji Yoshimoto, Brandon L. Peters, Gurdaman S. Khaira, Juan J. de Pablo

Proceedings Volume 8323, Alternative Lithographic Technologies IV; 83232P (2012) https://doi.org/10.1117/12.917830
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Directed self-assembly (DSA) patterning has been increasingly investigated as an alternative lithographic process for future technology nodes. One of the critical specs for DSA patterning is defects generated through annealing process or by roughness of pre-patterned structure. Due to their high sensitivity to the process and wafer conditions, however, characterization of those defects still remain challenging. DSA simulations can be a powerful tool to predict the formation of the DSA defects. In this work, we propose a new method to perform parallel computing of DSA Monte Carlo (MC) simulations. A consumer graphics card was used to access its hundreds of processing units for parallel computing. By partitioning the simulation system into non-interacting domains, we were able to run MC trial moves in parallel on multiple graphics-processing units (GPUs). Our results show a significant improvement in computational performance.

Citation Download Citation

Kenji Yoshimoto, Brandon L. Peters, Gurdaman S. Khaira, and Juan J. de Pablo "Scalable simulations for directed self-assembly patterning with the use of GPU parallel computing", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83232P (21 March 2012); https://doi.org/10.1117/12.917830

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