Primary structure control of ArF resist polymer by regulating feed rate of monomers and initiator

Tomoya Oshikiri; Atsushi Yasuda; Keisuke Kato; Shin-ichi Maeda

doi:10.1117/12.879421

15 April 2011 Primary structure control of ArF resist polymer by regulating feed rate of monomers and initiator

Tomoya Oshikiri, Atsushi Yasuda, Keisuke Kato, Shin-ichi Maeda

Proceedings Volume 7972, Advances in Resist Materials and Processing Technology XXVIII; 79721U (2011) https://doi.org/10.1117/12.879421
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

For a purpose of decreasing a defect risk, a primary structure of a polymer such as molecular weight, composition of comonomer and its sequence plays significantly important roll. Concerning to a typical radical polymerization, molecular weight and composition are controllable by regulating feed rate of initiator and monomers. At first, a simulation program predicting the radical polymerization was constructed. Then, the conventional polymerization procedure was modified by simulation to give the ideal primary structure. After that, the optimized procedure was verified by an actual experiment. The obtained homogeneous polymer showed good lithographic performance. In addition, a direct observation of the developed surface was achieved by scanning probe microscopy.

Citation Download Citation

Tomoya Oshikiri, Atsushi Yasuda, Keisuke Kato, and Shin-ichi Maeda "Primary structure control of ArF resist polymer by regulating feed rate of monomers and initiator", Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79721U (15 April 2011); https://doi.org/10.1117/12.879421

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