Paper
2 February 1988 Wideband Probing Techniques For Planar Devices: A Review
Eric w. Strid
Author Affiliations +
Proceedings Volume 0795, Characterization of Very High Speed Semiconductor Devices and Integrated Circuits; (1988) https://doi.org/10.1117/12.940939
Event: Advances in Semiconductors and Semiconductor Structures, 1987, Bay Point, FL, United States
Abstract
Abstract: A review of high-frequency wafer-probing techniques which use contact to the device under test is given. 50-ohm probes have recently been developed for frequencies up to 50 GHz. On-wafer impedance standards and calibration accuracies have also improved. Probes for high-speed MSI circuits require low-impedance power-supply connections. Probes for non-intrusive measurement of internal IC nodes are also reviewed.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eric w. Strid "Wideband Probing Techniques For Planar Devices: A Review", Proc. SPIE 0795, Characterization of Very High Speed Semiconductor Devices and Integrated Circuits, (2 February 1988); https://doi.org/10.1117/12.940939
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Semiconducting wafers

Calibration

Field effect transistors

Inductance

Integrated circuits

Semiconductors

Capacitance

RELATED CONTENT

Ultra-submicrometer microwave GaAs MESFETs and HEMTs
Proceedings of SPIE (August 01 1990)
Testing Monolithic GaAs MMIC Circuits
Proceedings of SPIE (February 02 1988)
High Transconductance OGFETs
Proceedings of SPIE (April 22 1987)

Back to Top