Novel analysis system using surface desorption stimulated by VUV photons from laser-produced plasma

Masahito Katto; Masanori Kaku; Shoichi Kubodera; Atushi Yokotani; Nobuyoshi Miyabayashi; Wataru Sasaki

doi:10.1117/12.880303

15 November 2010 Novel analysis system using surface desorption stimulated by VUV photons from laser-produced plasma

Masahito Katto, Masanori Kaku, Shoichi Kubodera, Atushi Yokotani, Nobuyoshi Miyabayashi, Wataru Sasaki

Proceedings Volume 7751, XVIII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; 77511D (2010) https://doi.org/10.1117/12.880303
Event: 18th International Symposium on Gas Flow and Chemical Lasers and High Power Lasers, 2010, Sofia, Bulgaria

Abstract

We proposed and developed a novel surface analysis system using vacuum ultraviolet (VUV) photons. When the VUV photons were irradiated on the material surface, surface desorption was stimulated. The desorbed species were analyzed by the mass spectrometer. First, we studied the decomposition process induced by VUV photons from excimer lamps. We found that the different photon energy resulted in the different time dependence of the fragments signals even if the materials had similar chemical construction. It suggested that the identification of the materials should be possible by tracing the decomposition process. We developed an analyzing system, called "Photo-Stimulated Desorption (PSD) mass spectrometer" using a broadband VUV radiation from the Ar plasma excited by a Q-switched Nd:YAG laser. The desorbed species were analyzed by the quadrupole mass spectrometer. This PSD system was useful surface analysis tool not only for the semiconductor but also plastics, which is easily affected by heat.

Citation Download Citation

Masahito Katto, Masanori Kaku, Shoichi Kubodera, Atushi Yokotani, Nobuyoshi Miyabayashi, and Wataru Sasaki "Novel analysis system using surface desorption stimulated by VUV photons from laser-produced plasma", Proc. SPIE 7751, XVIII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 77511D (15 November 2010); https://doi.org/10.1117/12.880303

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