Antireflection on plastic substrates using ion etching with discontinuous metallic film

Yu-Wen Yeh; Sheng-Hui Chen; Cheng-Chung Lee; Shih-Liang Ku; Chao-Chun Huang

doi:10.1117/12.842913

16 February 2010 Antireflection on plastic substrates using ion etching with discontinuous metallic film

Yu-Wen Yeh, Sheng-Hui Chen, Cheng-Chung Lee, Shih-Liang Ku, Chao-Chun Huang

Proceedings Volume 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III; 759112 (2010) https://doi.org/10.1117/12.842913
Event: SPIE MOEMS-MEMS, 2010, San Francisco, California, United States

Abstract

When a plastic substrate is under a highlight, the reflected light on the substrate always dazzles the observer. To prevent the effect, anti-reflected (AR) coating is applied. However AR-coating is difficult to be designed with wide wavelength range. In this research, the discontinuous metallic films were fabricated on the plastic substrates to reduce the reflection of the plastic substrates with wide wavelength range. To reduce more reflectance, the discontinuous metallic film can also be applied as the mask of selective ion etching to achieve rough surface. The results show the average reflectance of the AR-coating on the plastic substrates has been decreased 5%. The average transmittance has been increased 3%.

Citation Download Citation

Yu-Wen Yeh, Sheng-Hui Chen, Cheng-Chung Lee, Shih-Liang Ku, and Chao-Chun Huang "Antireflection on plastic substrates using ion etching with discontinuous metallic film", Proc. SPIE 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III, 759112 (16 February 2010); https://doi.org/10.1117/12.842913

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