Intracavity Laser Spectroscopy: Chemical Vapor Deposition And Supersonic Jet Expansions

J. J. O'Brien; N. Goldstein; G. H. Atkinson

doi:10.1117/12.966909

1 January 1987 Intracavity Laser Spectroscopy: Chemical Vapor Deposition And Supersonic Jet Expansions

J. J. O'Brien, N. Goldstein, G. H. Atkinson

Proceedings Volume 0742, Laser Applications to Chemical Dynamics; (1987) https://doi.org/10.1117/12.966909
Event: OE LASE'87 and EO Imaging Symposium, 1987, Los Angeles, CA, United States

Abstract

The high sensitivity of intracavity laser spectroscopy (ILS) for direct, quantitative detection of species at low concentrations and in special environments has been well established. In this paper, we demonstrate the use of ILS to obtain rotationally-resolved absorption spectra of (i) reactive radical species in situ during chemical vapor deposition (CVD) processes used to produce silicon films and (ii) ultra-cold gas phase molecules and van der Waals (vdW) complexes produced in supersonic jet expansions. Information on the chemistry of CVD processes for a number of silicon source materials and the formation efficiencies, stability and excited-state dissociation dynamics for a series of I₂-noble gas vdW complexes is presented.

Citation Download Citation

J. J. O'Brien, N. Goldstein, and G. H. Atkinson "Intracavity Laser Spectroscopy: Chemical Vapor Deposition And Supersonic Jet Expansions", Proc. SPIE 0742, Laser Applications to Chemical Dynamics, (1 January 1987); https://doi.org/10.1117/12.966909

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