Integration of photochemical processes of silicon surface cleaning with deposition of thin solid films

A. P. Alekhin; Yu. S. Bokov; L. A. V'iukov; A. M. Markeev; V. N. Nevolin; N. S. Samsonov; V. Yu. Fominski

doi:10.1117/12.195878

12 December 1994 Integration of photochemical processes of silicon surface cleaning with deposition of thin solid films

A. P. Alekhin, Yu. S. Bokov, L. A. V'iukov, A. M. Markeev, V. N. Nevolin, N. S. Samsonov, V. Yu. Fominski

Proceedings Volume 2332, Second International Symposium on Advanced Laser Technologies; (1994) https://doi.org/10.1117/12.195878
Event: Advanced Laser Technologies: International Symposium, 1993, Prague, Czech Republic

Abstract

The possibility of a low temperature technique development including combined photochemical processes of the silicon substrate cleaning, chemical vapor deposition and post treatment of SiO₂ has been demonstrated.

Citation Download Citation

A. P. Alekhin, Yu. S. Bokov, L. A. V'iukov, A. M. Markeev, V. N. Nevolin, N. S. Samsonov, and V. Yu. Fominski "Integration of photochemical processes of silicon surface cleaning with deposition of thin solid films", Proc. SPIE 2332, Second International Symposium on Advanced Laser Technologies, (12 December 1994); https://doi.org/10.1117/12.195878

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