Improvements on the simulation of microscopic images for the defect detection of nanostructures

Stephan Rafler; Thomas Schuster; Karsten Frenner; Wolfgang Osten; Uwe Seifert

doi:10.1117/12.772498

16 April 2008 Improvements on the simulation of microscopic images for the defect detection of nanostructures

Stephan Rafler, Thomas Schuster, Karsten Frenner, Wolfgang Osten, Uwe Seifert

Proceedings Volume 6922, Metrology, Inspection, and Process Control for Microlithography XXII; 692215 (2008) https://doi.org/10.1117/12.772498
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

The optical defect identification on wafer still remains a useful tool, even if the structure sizes have the order of magnitude of the used wavelengths of the light and far beyond it. Structures are not resolved in this way, but one receives a contrast in the microscopic image of a defect with a certain illumination configuration. We show simulations of such images at structures relevant for practice and present methods to accelerate the computations. These accelerations can cause a loss of accuracy, but they can give hints to useful illumination configurations.

Citation Download Citation

Stephan Rafler, Thomas Schuster, Karsten Frenner, Wolfgang Osten, and Uwe Seifert "Improvements on the simulation of microscopic images for the defect detection of nanostructures", Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 692215 (16 April 2008); https://doi.org/10.1117/12.772498

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