Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions

K. Nishihara; A. Sunahara; A. Sasaki; S. Fujioka; Y. Shimada; M. Nunami; H. Tanuma; M. Murakami; T. Aota; K. Fujima; H. Furukawa; T. Nishikawa; F. Koike; R. More; T. Kato; V. Zhakhovskii; K. Gamata; H. Ueda; H. Nishimura; Y. Yuba; K. Nagai; N. Miyanaga; Y. Izawa; K. Mima

doi:10.1117/12.769086

20 March 2008 Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions

K. Nishihara, A. Sunahara, A. Sasaki, S. Fujioka, Y. Shimada, M. Nunami, H. Tanuma, M. Murakami, T. Aota, K. Fujima, H. Furukawa, T. Nishikawa, F. Koike, R. More, T. Kato, V. Zhakhovskii, K. Gamata, H. Ueda, H. Nishimura, Y. Yuba, K. Nagai, N. Miyanaga, Y. Izawa, K. Mima

Author Affiliations +

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 69210Y (2008) https://doi.org/10.1117/12.769086
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

We propose a new scheme for high conversion efficiency from laser energy to 13.5 nm extreme ultra violet emission within 2 % band width, a double pulse laser irradiation scheme with a tin droplet target. We consider two-color lasers, a Nd:YAG laser with 1.06 µm in wavelength as a prepulse and a carbon dioxide laser with 10.6 µm in wavelength for a main pulse. We show the possibility of obtaining a CE of 5 - 7 % using a benchmarked radiation hydro code. We have experimentally tested the new scheme and observed increase of CE greater than 4 %. We show many additional advantages of the new scheme, such as reduction of neutral debris, energy reduction of debris ions, and decrease of out of band emission. We also discuss debris problems, such as ion sputtering using newly developed MD simulations, ion mitigation by a newly designed magnetic coil using 3-PIC simulations and tin cleaning experiments.

Citation Download Citation

K. Nishihara, A. Sunahara, A. Sasaki, S. Fujioka, Y. Shimada, M. Nunami, H. Tanuma, M. Murakami, T. Aota, K. Fujima, H. Furukawa, T. Nishikawa, F. Koike, R. More, T. Kato, V. Zhakhovskii, K. Gamata, H. Ueda, H. Nishimura, Y. Yuba, K. Nagai, N. Miyanaga, Y. Izawa, and K. Mima "Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69210Y (20 March 2008); https://doi.org/10.1117/12.769086

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