Evaluation of the effect of mask-blank flatness on CDU and DOF in high-NA systems

Christopher Lee; Chia Wen Chang; Tomas Chin; Richard Lu; Steven Fan; Derek Chen; Gordon Chan; Torey Huang

doi:10.1117/12.746614

30 October 2007 Evaluation of the effect of mask-blank flatness on CDU and DOF in high-NA systems

Christopher Lee, Chia Wen Chang, Tomas Chin, Richard Lu, Steven Fan, Derek Chen, Gordon Chan, Torey Huang

Proceedings Volume 6730, Photomask Technology 2007; 67300D (2007) https://doi.org/10.1117/12.746614
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

The purpose of paper is to investigate the impact of mask blank flatness on critical dimension uniformity (CDU) and depth of focus (DOF) in the wafer printing process with a test pattern designed for 65nm node technology. In this experiment we use 3 test masks with different flatness (0.3T, 0.5T and 1T), and the same test pattern array. The mask flatness was measured with a Tropel® UltraFlat^TM 200, and the focus error is extracted from the CD data of the focus and energy matrix (FEM) analysis. The goal of the study is to quantify the mask flatness influence on the high-numerical aperture (NA) lithographic process.

Citation Download Citation

Christopher Lee, Chia Wen Chang, Tomas Chin, Richard Lu, Steven Fan, Derek Chen, Gordon Chan, and Torey Huang "Evaluation of the effect of mask-blank flatness on CDU and DOF in high-NA systems", Proc. SPIE 6730, Photomask Technology 2007, 67300D (30 October 2007); https://doi.org/10.1117/12.746614

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