Chia Wen Chang
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 30 October 2007 Paper
Christopher Lee, Chia Wen Chang, Tomas Chin, Richard Lu, Steven Fan, Derek Chen, Gordon Chan, Torey Huang
Proceedings Volume 6730, 67300D (2007) https://doi.org/10.1117/12.746614
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Finite element methods, Critical dimension metrology, Error analysis, Lutetium, Fluctuations and noise, Printing, Pellicles

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