Mask Industry Assessment: 2007

Gilbert Shelden; Patricia Marmillion; Greg Hughes

doi:10.1117/12.730158

23 October 2007 Mask Industry Assessment: 2007

Gilbert Shelden, Patricia Marmillion, Greg Hughes

Proceedings Volume 6730, Photomask Technology 2007; 673003 (2007) https://doi.org/10.1117/12.730158
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top critical issues. A survey was created with support from SEMATECH and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of semiconductor company mask technologists, merchant mask suppliers, and industry equipment makers. This year's assessment is the sixth in the current series of annual reports. With ongoing industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey is basically the same as the 2005 and 2006 surveys. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns and Services, Operating Cost Factors, and Equipment Utilization. Within each category is a multitude of questions that create a detailed profile of both the business and technical status of the critical mask industry.

Citation Download Citation

Gilbert Shelden, Patricia Marmillion, and Greg Hughes "Mask Industry Assessment: 2007", Proc. SPIE 6730, Photomask Technology 2007, 673003 (23 October 2007); https://doi.org/10.1117/12.730158

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