Contributions to innate material roughness in resist

Jeanette M. Roberts; Robert Meagley; Theodore H. Fedynyshyn; Roger F. Sinta; David K. Astolfi; Russell B. Goodman; Alberto Cabral

doi:10.1117/12.655740

29 March 2006 Contributions to innate material roughness in resist

Jeanette M. Roberts, Robert Meagley, Theodore H. Fedynyshyn, Roger F. Sinta, David K. Astolfi, Russell B. Goodman, Alberto Cabral

Author Affiliations +

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 61533U (2006) https://doi.org/10.1117/12.655740
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

A method has been developed to probe the Innate Material Roughness (IMR) of resist materials. We have applied this to EUV and 248 nm resists to deconvolute the material contributions to roughness: 1) the polymer alone, 2) interaction between the polymer, photoacid generator (PAG), base quencher, and photolysis byproducts, 3) the effects of exposure, and 4) development. We studied ESCAP based resists (with more limited data on APEX polymers), an iodonium nonaflate PAG, a tetabutyl ammonium hydroxide (TBAH) base quencher, and standard tetramethylammonium hydroxide (TMAH) development.

Citation Download Citation

Jeanette M. Roberts, Robert Meagley, Theodore H. Fedynyshyn, Roger F. Sinta, David K. Astolfi, Russell B. Goodman, and Alberto Cabral "Contributions to innate material roughness in resist", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61533U (29 March 2006); https://doi.org/10.1117/12.655740

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