Resist dissolution behavior according to protecting group in polymer

Kwanghwyi Im; Jin Jegal; Jungkook Park; Deogbae Kim; Jaehyun Kim

doi:10.1117/12.655458

29 March 2006 Resist dissolution behavior according to protecting group in polymer

Kwanghwyi Im, Jin Jegal, Jungkook Park, Deogbae Kim, Jaehyun Kim

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 61533Q (2006) https://doi.org/10.1117/12.655458
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

In DUV CAR resists, deprotecting reaction and dissolution behavior depend upon the bulkiness and activation energy of protecting group. These factors have influences on resist performance (resolution, focus and exposure latitude margin, line width roughness). For further understanding this behavior, we investigated the dissolution parameters of resist related to the bulkiness, activation energy of protecting group, and we confirmed their effects on the resist performance using lithography evaluation. We will report and discuss the effect of structure and chemical properties of each protecting group on the dissolution behavior of resist in detail in this paper.

Citation Download Citation

Kwanghwyi Im, Jin Jegal, Jungkook Park, Deogbae Kim, and Jaehyun Kim "Resist dissolution behavior according to protecting group in polymer", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61533Q (29 March 2006); https://doi.org/10.1117/12.655458

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