The possibility of CrOx as the top coating material on a MoSi HT

Noriyuki Harashima; Hiroyuki Iso; Tatsuya Isozaki; Naohiro Umeo; Takaei Sasaki

doi:10.1117/12.633291

8 November 2005 The possibility of CrOx as the top coating material on a MoSi HT

Noriyuki Harashima, Hiroyuki Iso, Tatsuya Isozaki, Naohiro Umeo, Takaei Sasaki

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59923R (2005) https://doi.org/10.1117/12.633291
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

A binary Cr is widely used material as the top coating on a MoSi HT. Generally, a binary Cr mask has larger GL(Global loading) than a MoSi HT by dry etching process. Now we are using a binary Cr as the masking material for a MoSi HT. So if we want to make a MoSi HT pattern with smaller CD variation, we have to make a smaller CD variation for Cr pattern. Two layers, that is, a metal Cr film and a CrOx film, make a binary Cr. GL is one of the source of a CD variation on a MoSi HT. In our investigation, a binary Cr GL is caused by a metal Cr GL. In order to make a MoSi HT with smaller CD variation, we examined monolayer CrOx film, which has a shorter dry etching time and a smaller GL property. As the result, we conformed the optimized monolayer CrOx film can be used as a good masking material for MoSi HT production. We improved GL by the monolayer CrOx film and we found it has a proper OD(Optical Density) and a excellent electric conductivity on a MoSi HT.

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Noriyuki Harashima, Hiroyuki Iso, Tatsuya Isozaki, Naohiro Umeo, and Takaei Sasaki "The possibility of CrOx as the top coating material on a MoSi HT", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59923R (8 November 2005); https://doi.org/10.1117/12.633291

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