Step and repeat UV-nanoimprint lithography using a large area stamp

Jun-ho Jeong; Young-suk Sim; Hyonkee Sohn; Eung-sug Lee

doi:10.1117/12.598657

6 May 2005 Step and repeat UV-nanoimprint lithography using a large area stamp

Jun-ho Jeong, Young-suk Sim, Hyonkee Sohn, Eung-sug Lee

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.598657
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. To apply a large-area stamp to step-and-repeat UV-NIL in an atmospheric environment for high-throughput, we proposed a new step-and-repeat UV-NIL process using an elementwise patterned stamp (EPS), which consists of elements separated by channels. The proposed UV-NIL is able to imprint an 8-in. wafer with a 5 sq. in EPS in four times. 50 - 80 nm features of the EPS were successfully transferred over 8-in. wafers. The experiments demonstrated that a large-area EPS in the step-and-repeat UV-NIL can be used for imprinting 8-in. wafers in an atmospheric environment.

Citation Download Citation

Jun-ho Jeong, Young-suk Sim, Hyonkee Sohn, and Eung-sug Lee "Step and repeat UV-nanoimprint lithography using a large area stamp", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.598657

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