Paper
25 May 2004 1/f noise in deep submicron CMOS technology for RF and analogue applications
Author Affiliations +
Proceedings Volume 5470, Noise in Devices and Circuits II; (2004) https://doi.org/10.1117/12.546962
Event: Second International Symposium on Fluctuations and Noise, 2004, Maspalomas, Gran Canaria Island, Spain
Abstract
As further enhanced functionalities of mobile equipment are predicted, the development of a CMOS technology that provides low-power, high-speed, and low-noise performance has become an urgent and hot issue. For these application driven technologies the complexity must be tackled at different levels to insure the optimisation of the area, the power consumption, the speed and the reliability. Therefore this paper present a review of the solutions implemented at different levels from system down to technology in order to reduce the contribution of the low frequency noise. These achievements are illustrated by experimental results from literature and are inserted in the general context of system design strategies for reducing the 1/f noise contribution. In a first part dedicated to high-level system and circuit design, we introduce the noise reduction by switching techniques and the methodology for including the noise dispersion in scaled devices for the early design of analogue/RF circuits. In the second part, the 1/f noise is tackled at its origins i.e. the choice of the gate oxide and other critical process steps.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mercha Abdelkarim, Eddy Simoen, Stefaan Decoutere, and Cor Claeys "1/f noise in deep submicron CMOS technology for RF and analogue applications", Proc. SPIE 5470, Noise in Devices and Circuits II, (25 May 2004); https://doi.org/10.1117/12.546962
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KEYWORDS
CMOS technology

Oxides

Dielectrics

Field effect transistors

Transistors

Analog electronics

Switching

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