Paper
26 June 2003 Experimental determination of lens aberrations from the intensity point-spread function in the focal region
Peter Dirksen, Joseph J. M. Braat, Augustus J. E. M. Janssen, Casper A. H. Juffermans, Ad Leeuwestein
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Abstract
In this paper we show various results of aberration retrieval using the pinhole method in conjunction with the extended Nijboer-Zernike theory. The experiments are performed on modern wafer scanners. Keyboard commanded offsets of the movable lens elements of the imaging tool have been used to introduce astigmatism, coma and spherical aberration in a controlled way. The method is designed to estimate these induced aberrations and we show the experimental results regarding the various types of aberrations created this way.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter Dirksen, Joseph J. M. Braat, Augustus J. E. M. Janssen, Casper A. H. Juffermans, and Ad Leeuwestein "Experimental determination of lens aberrations from the intensity point-spread function in the focal region", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485388
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Cited by 5 scholarly publications.
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KEYWORDS
Monochromatic aberrations

Spherical lenses

Optical lithography

Scanners

Semiconducting wafers

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