Evaluation of Zernike sensitivity method for CD distribution

Toshiharu Nakashima; Steve D. Slonaker; Takehito Kudo; Shigeru Hirukawa

doi:10.1117/12.485454

26 June 2003 Zernike sensitivity method for CD distribution

Toshiharu Nakashima, Steve D. Slonaker, Takehito Kudo, Shigeru Hirukawa

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485454
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Wavefront aberrations of the projection lens are measured in many situations. The results are expressed by coefficients of Zernike polynomials that can be used as a basis for critical dimensions (CD) performance evaluation. Here we investigated several methods to obtain the CD distribution from the Zernike coefficients. We present three unique methods, called “Transformation of CD-Focus", "Conversion of Defocus into Aberrations" and “Response Surface of Aerial Image". These methods calculate CD distribution faster than direct simulations. Five tests with different cases were conducted to compare the three methods. Their accuracies are reported.

Citation Download Citation

Toshiharu Nakashima, Steve D. Slonaker, Takehito Kudo, and Shigeru Hirukawa "Zernike sensitivity method for CD distribution", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485454

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