Identification and quantitative analysis of contaminants found in photolithography purge gases

Allan Tram; Jeff J. Spiegelman; Russell J. Holmes; Daniel Alvarez; Dan Lev

doi:10.1117/12.488483

2 June 2003 Identification and quantitative analysis of contaminants found in photolithography purge gases

Allan Tram, Jeff J. Spiegelman, Russell J. Holmes, Daniel Alvarez, Dan Lev

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.488483
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

The measurement of organic and inorganic contaminants in photolithography purge gas is validated to below a 1 part-per-trillion lower detection limit using a Cold Trap concentrated method. To investigate the contaminant loading history into a purifier during its lifetime, a Purifier Information Retrieval Service (PIRS) is developed with measurement sensitivity below 0.01 microgram. This method is validated by accurately loading and unloading known challenges of contaminants into a GateKeeper purifier. The result indicates that if a purifier is operating at 100% duty cycle and 1 slm for 1 year, an annual quantitative measurement average of the impurites in the process gas of less than 5 part-per-quadrillion can be achieved.

Citation Download Citation

Allan Tram, Jeff J. Spiegelman, Russell J. Holmes, Daniel Alvarez, and Dan Lev "Identification and quantitative analysis of contaminants found in photolithography purge gases", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.488483

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