Increased yield and tool life by reduction of DUV photo contamination using parts-per-trillion pure purge gases

Cristian Landoni; Marco Succi; Larry Rabellino

doi:10.1117/12.656623

24 March 2006 Increased yield and tool life by reduction of DUV photo contamination using parts-per-trillion pure purge gases

Cristian Landoni, Marco Succi, Larry Rabellino

Author Affiliations +

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61523K (2006) https://doi.org/10.1117/12.656623
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

This paper describes some of the results collected during the study of improved purification materials, qualification of regenerability performances and newly developed ways to detect Acids, Bases and Siloxanes at the sub-ppt levels. Removal validation down to single ppt levels has been demonstrated for several impurities such as: NH₃, SO₂ and Hexamethyldisiloxane (HMDSO).

Citation Download Citation

Cristian Landoni, Marco Succi, and Larry Rabellino "Increased yield and tool life by reduction of DUV photo contamination using parts-per-trillion pure purge gases", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61523K (24 March 2006); https://doi.org/10.1117/12.656623

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available