Collinearity and stitching performance on an ASML stepper

Michael J.E. Van de Moosdijk; Ennos Van den Brink; Klaus Simon; Alexander Friz; Geoffrey N. Phillipps; Richard J. Travers; Erik Raaymakers

doi:10.1117/12.472358

1 July 2002 Collinearity and stitching performance on an ASML stepper

Michael J.E. Van de Moosdijk, Ennos Van den Brink, Klaus Simon, Alexander Friz, Geoffrey N. Phillipps, Richard J. Travers, Erik Raaymakers

Author Affiliations +

Proceedings Volume 4688, Emerging Lithographic Technologies VI; (2002) https://doi.org/10.1117/12.472358
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

The exponential increase in areal density of magnetic hard disk drives during the last years has led to incredibly tighter manufacturing tolerances. For the lithography process that is being used to make the principal component in a hard disk drive, the read-write head, this means that improved process control is required with respect to imaging and positioning performance. Beside the overlay performance from layer to layer, the relative placement of images in a single critical layer is being looked at as an important performance requirement on state-of-the-art DUV and I-line steppers. The terms stitching and co-linearity characterize the relative placement of images in a single layer. In this paper verification tests for stitching and co-linearity are presented, as they are developed by ASML. Since these tests require an understanding of the terms stitching and co-linearity, the definitions of these terms are outlined. The results for the two tests on an ASML PAS 5500/300 DUV stepper are presented and discussed. Also the effects of certain error sources and some ideas for future optimization are shown.

Citation Download Citation

Michael J.E. Van de Moosdijk, Ennos Van den Brink, Klaus Simon, Alexander Friz, Geoffrey N. Phillipps, Richard J. Travers, and Erik Raaymakers "Collinearity and stitching performance on an ASML stepper", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472358

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