Development of thin-film total-reflection mirrors for the XUV FEL

Sandra Jacobi; Joerg Wiesmann; Barbara Steeg; Josef Feldhaus; Carsten Michaelsen

doi:10.1117/12.452974

28 December 2001 Development of thin-film total-reflection mirrors for the XUV FEL

Sandra Jacobi, Joerg Wiesmann, Barbara Steeg, Josef Feldhaus, Carsten Michaelsen

Proceedings Volume 4500, Optics for Fourth-Generation X-Ray Sources; (2001) https://doi.org/10.1117/12.452974
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

A free electron laser for the XUV spectral range is currently under test at the TESLA Test Facility at DESY. High gain has been demonstrated below 100nm wavelength, and it is expected that the FEL will provide intense, sub-picosecond radiation pulses with photon energies up to 200eV. Thin film optical elements required for this facility are currently being developed by the X-ray optics group of the GKSS research center near Hamburg. Sputter-deposited coatings have been prepared for the use as total reflection X-ray mirrors for FEL beam optics. Coatings of low Z elements with the lowest possible absorption and high reflectivity have been investigated. Silicon substrates have been coated with carbon using different deposition conditions. The films were investigated using the soft X-ray reflectometer at the HASYLAB beamline G1. The measurements show that the reflectivity of the films is typically 90% at energies below 200eV and a grazing incidence angle of 4 degrees. The optical constants of these coatings obtained from the reflectivity measurements and are in agreement with tabulated values. The deposition parameters have been optimized resulting in argon contamination free films with near-theoretical performance. Preliminary investigations concerning the heat resistance of the films were also carried out.

Citation Download Citation

Sandra Jacobi, Joerg Wiesmann, Barbara Steeg, Josef Feldhaus, and Carsten Michaelsen "Development of thin-film total-reflection mirrors for the XUV FEL", Proc. SPIE 4500, Optics for Fourth-Generation X-Ray Sources, (28 December 2001); https://doi.org/10.1117/12.452974

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