Comparison of edge detection methods using a prototype overlay calibration artifact

Richard M. Silver; Jau-Shi Jay Jun; Edward Kornegay; Robert D. Morton

doi:10.1117/12.436777

22 August 2001 Comparison of edge detection methods using a prototype overlay calibration artifact

Richard M. Silver, Jau-Shi Jay Jun, Edward Kornegay, Robert D. Morton

Proceedings Volume 4344, Metrology, Inspection, and Process Control for Microlithography XV; (2001) https://doi.org/10.1117/12.436777
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Accurate overlay measurements rely on robust, repeatable, and accurate feature position determination. In our effort to develop traceable overlay standards we have examined a number of edge detection methods and the parameters which affect those measurements. The samples used in this study are a comprehensive set of prototype overlay wafer standards. The methods for determining the position of a feature generally rely on some determination of edges, and the resulting feature centerline can be significantly affected by the method of choice. We have compared cross- correlation, centroid, and edge-threshold methods as well as an integrated least squares method. This paper is focused on empirical results obtained through the measurement of relevant overlay targets and pitch specimens. The data presented in this paper was acquired using charge coupled device (CCD)-based arrays.

Citation Download Citation

Richard M. Silver, Jau-Shi Jay Jun, Edward Kornegay, and Robert D. Morton "Comparison of edge detection methods using a prototype overlay calibration artifact", Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); https://doi.org/10.1117/12.436777

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