Research on the electron beam spot detection methods based on SEM

Weixia Zhao; Junbiao Liu; Geng Niu; Yutian Ma; Li Han

doi:10.1117/12.2245029

25 October 2016 Research on the electron beam spot detection methods based on SEM

Weixia Zhao, Junbiao Liu, Geng Niu, Yutian Ma, Li Han

Proceedings Volume 9687, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subnanometer Accuracy Measurement for Synchrotron Optics and X-Ray Optics; 96870C (2016) https://doi.org/10.1117/12.2245029
Event: Eighth International Symposium on Advanced Optical Manufacturing and Testing Technology (AOMATT2016), 2016, Suzhou, China

Abstract

X-ray Nano-Computed Tomography (Nano-CT) is widely used in micro device nondestructive testing, material science, life science and other applications fields. Micro-focus X-ray source is one of the key components of Nano-CT and is directly affected by the quality of electron beam. Diameter is the key performance index of electron beam. The detection of electron beam spot diameter is of great significance for monitoring the performance of Nano-CT and quantitatively evaluating the qualities of design and fabrication of the electron gun and electron optical system. In this paper, the diameter direct detecting method is presented and applied to the FEI Quanta 600 SEM. The relationship between electron beam diameter and detecting curve is analyzed at first, then the application feature of diameter detecting methods, including crosshair detecting method, slit detecting method and single edge detecting method, is researched and compared. Furthermore, the experimental results demonstrate that the edge detection has higher detecting accuracy and lower requirement on the sampler, and that after computation the detecting error is within 20 nm.

Citation Download Citation

Weixia Zhao, Junbiao Liu, Geng Niu, Yutian Ma, and Li Han "Research on the electron beam spot detection methods based on SEM", Proc. SPIE 9687, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subnanometer Accuracy Measurement for Synchrotron Optics and X-Ray Optics, 96870C (25 October 2016); https://doi.org/10.1117/12.2245029

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Electron beams

Reticles

Calibration

Scanning electron microscopy

Edge detection

Semiconducting wafers

Signal detection

Show All Keywords

Keywords/Phrases

Search In:

Publication Years