Numerical simulation of continuous Nd:YAG laser annealing of InP

Renwu Fu; Zhihua Cai; Chao Chen; Marija I. Markevich; A. M. Chaplanov

doi:10.1117/12.408430

29 November 2000 Numerical simulation of continuous Nd:YAG laser annealing of InP

Renwu Fu, Zhihua Cai, Chao Chen, Marija I. Markevich, A. M. Chaplanov

Author Affiliations +

Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408430
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China

Abstract

The semiconductor solid phase epitaxial model of continuous laser-annealing is used to simulate the laser-annealing process of different doping concentration of InP at the continuous Nd:YAG laser. Specially, quasi-static model is used to simulate the radial heat dissipation from radiant region to radiationless region. At the same time, thermal conductivity and optical absorption coefficient varied with temperature is also considered. The method of hidden-form different is used in solving 1D, non-homogeneous, nonlinear partial differential equation of heat conduction. At the room temperature T₀ equals 300 K and the power intensity of laser I₀ equals 800 W/cm², the result is that the temperature of surface reaches about 1290 K after 3.8 sec.

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Renwu Fu, Zhihua Cai, Chao Chen, Marija I. Markevich, and A. M. Chaplanov "Numerical simulation of continuous Nd:YAG laser annealing of InP", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408430

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