Development of a fast linewidth correction system

Ryuji Takenouchi; Isao Ashida; Hiroichi Kawahira

doi:10.1117/12.392081

19 July 2000 Development of a fast linewidth correction system

Ryuji Takenouchi, Isao Ashida, Hiroichi Kawahira

Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392081
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan

Abstract

A fast line width correction system which has significantly small increase in the processing time by adding new correction rules for improving correction accuracy has been developed. This system corrects only patterns which have edges with 45 X n degree angles, thereby, these patterns are operated at high speed by the scan line method known as a fast algorithm for geometrical operations. Also, angled patterns can be further simply corrected than that with the conventional system. The system is operated on a clustering system at high performance using multiple machines such as middle class PC-UNIX. As a result, total elapsed processing time for the gate layer with around 150 M gates 0.18 micrometers logic with embedded DRAM was improved by a factor of 9.3 with this system in comparison to that with a conventional system. In this paper, details of the system design and application for actual 0.18 micrometers devices will be further discussed.

Citation Download Citation

Ryuji Takenouchi, Isao Ashida, and Hiroichi Kawahira "Development of a fast linewidth correction system", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); https://doi.org/10.1117/12.392081

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