Ultranarrow-bandwidth excimer lasers for 248-nm DUV lithography

Rainer Paetzel; Hans Stephen Albrecht; Vadim Berger; Igor Bragin; Matthias Kramer; Juergen Kleinschmidt; Marcus Serwazi

doi:10.1117/12.388985

5 July 2000 Ultranarrow-bandwidth excimer lasers for 248-nm DUV lithography

Rainer Paetzel, Hans Stephen Albrecht, Vadim Berger, Igor Bragin, Matthias Kramer, Juergen Kleinschmidt, Marcus Serwazi

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388985
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

We have developed a KrF excimer laser with ultra narrow linewidth and high repetition rate applicable for optical lithography using DUV wafer scanners with highest numerical aperture (NA) of more than 0.8. A laser bandwidth of less than 0.4 pm, full width half maximum, is achieved by our new design of the laser resonator, which is based on out patented polarization coupled resonator. The new resonator design increase the efficiency of ht laser optics and improves the wavelength stability. The laser tube and solid sate pulser have been adapted to the new laser resonator. As a result, another step in the reduction of the cost of operation is achieved. The laser operates with a repetition rate of 2 kHz and gives a large operation range with respect to wavelength and energy range. The characteristic performance of this new excimer laser is presented.

Citation Download Citation

Rainer Paetzel, Hans Stephen Albrecht, Vadim Berger, Igor Bragin, Matthias Kramer, Juergen Kleinschmidt, and Marcus Serwazi "Ultranarrow-bandwidth excimer lasers for 248-nm DUV lithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388985

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