0.13-um optical lithography for random logic devices using 248-nm attenuated phase-shifting masks

Yung-Tin Chen; Chia-Hui Lin; Hua Tai Lin; Hung-Chang Hsieh; Shinn Sheng Yu; Anthony Yen

doi:10.1117/12.388927

5 July 2000 0.13-μm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks

Yung-Tin Chen, Chia-Hui Lin, Hua Tai Lin, Hung-Chang Hsieh, Shinn Sheng Yu, Anthony Yen

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388927
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

We report here a lithography process for 0.13 micrometers lines using a high NA 248 nm scanner and attenuated phase-shifting masks (AttPSM) employing optical proximity correction with optimized assisting features. Our current result indicate a common depth of focus of 0.5 micrometers and exposure latitude of 10 percent for lines with line/space ratios from 1:1.2 to isolated. The mask error factor with assisting feature ranges from 1.2 to 1.5 depending on the duty ratio. The line edge roughness is less than 8 nm for our current KrF resist with AttPSM. We also explore the feasibility of strong and weak quadrupole illumination for process enhancement. The results show promising potential for proximity reduction and process window enhancement. Considering practical implementation in foundry fabs, we decided to concentrate our efforts on AttPSM with annular illumination plus OPC with assisting features. Our investigation indicates that 248 nm AttPSM technology is very attractive for 0.13 micrometers device fabrication.

Citation Download Citation

Yung-Tin Chen, Chia-Hui Lin, Hua Tai Lin, Hung-Chang Hsieh, Shinn Sheng Yu, and Anthony Yen "0.13-μm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388927

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available