Direct creation of microstuctures in fluorine-containing polymers

Vladimir Nazmov; Valery F. Pindyurin; Lubov A. Mezentseva; B. V. Mchedlishvili; Alexander I. Vilensky; V. V. Shirkova; V. E. Istomin

doi:10.1117/12.390037

21 July 2000 Direct creation of microstuctures in fluorine-containing polymers

Vladimir Nazmov, Valery F. Pindyurin, Lubov A. Mezentseva, B. V. Mchedlishvili, Alexander I. Vilensky, V. V. Shirkova, V. E. Istomin

Author Affiliations +

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390037
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Ablation of fluorine-containing polymers is studied under the influence of ionizing roentgen radiation. Physical-chemical properties of the polymers FEP and PVDF irradiated with synchrotron radiation were investigated. When film temperature increases because of the irradiation, intense removing of the polymer proceeds with high selectivity. Polymer membranes with regular disposition of through pores were created in the absorbing layer of submicron size in the process of irradiation of fluorine-containing films through a mask with regular holes.

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Vladimir Nazmov, Valery F. Pindyurin, Lubov A. Mezentseva, B. V. Mchedlishvili, Alexander I. Vilensky, V. V. Shirkova, and V. E. Istomin "Direct creation of microstuctures in fluorine-containing polymers", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390037

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