Direct evaluation of airborne contamination in chemically amplified resist films

Yoshio Yamashita; Takao Taguchi; Takeo Watanabe

doi:10.1117/12.210385

9 June 1995 Direct evaluation of airborne contamination in chemically amplified resist films

Yoshio Yamashita, Takao Taguchi, Takeo Watanabe

Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210385
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

Airborne contamination in chemically amplified resist films was evaluated by monitoring deprotection reaction using an IR spectrometer. T-BOC protected (20, 50 and 100 mol%) m- and p-cresol novolak resins and triphenyltriflate were used as a matrix polymer and a photoacid generator (PAG), respectively. Three levels of clean environments whose base contaminant (NH₄⁺) concentrations were 50 - 80, 5 - 10 and less than 1 ppb, were prepared for the experiments. In order to determine the delay effects precisely, other processes including baking, exposure, and storage during process intervals were conducted in a base-free environment. The PEB delay effect as well as radiation sensitivity without delay depended on the t-BOC content, and the best results were obtained at 50% and 25 - 50% t- BOC contents in m-cresol novolak and p-cresol novolak systems, respectively.

Citation Download Citation

Yoshio Yamashita, Takao Taguchi, and Takeo Watanabe "Direct evaluation of airborne contamination in chemically amplified resist films", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210385

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