Microstructuring with 157-nm laser light

Heinrich Endert; Michael Kauf; Eric E. Mayer; Michael J. Scaggs; John H. Fair; Dirk Basting

doi:10.1117/12.352726

15 July 1999 Microstructuring with 157-nm laser light

Heinrich Endert, Michael Kauf, Eric E. Mayer, Michael J. Scaggs, John H. Fair, Dirk Basting

Proceedings Volume 3618, Laser Applications in Microelectronic and Optoelectronic Manufacturing IV; (1999) https://doi.org/10.1117/12.352726
Event: Optoelectronics '99 - Integrated Optoelectronic Devices, 1999, San Jose, CA, United States

Abstract

The use of fluorine (F₂) lasers, emitting at 157 nm, offers new possibilities for key applications demanding very high resolution and/or higher photon energy to expand the laser-processable material spectrum. Promising results have been achieved using F₂ lasers at 157 nm for micromachining of various materials that are very difficult to process at other laser wavelengths. This paper reports about new F₂ laser source developments and their efficiency in processing Teflon/Polytetrafluoroethylene and fused silica under moderate, uniform illumination conditions. Ablation rates and threshold parameters have been investigated. Scanning electron micrographs of the produced microstructures are presented.

Citation Download Citation

Heinrich Endert, Michael Kauf, Eric E. Mayer, Michael J. Scaggs, John H. Fair, and Dirk Basting "Microstructuring with 157-nm laser light", Proc. SPIE 3618, Laser Applications in Microelectronic and Optoelectronic Manufacturing IV, (15 July 1999); https://doi.org/10.1117/12.352726

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