Prospects for long-pulse operation of ArF lasers for 193-nm microlithography

Thomas Hofmann; Bruce Johanson; Palash P. Das

doi:10.1117/12.389039

5 July 2000 Prospects for long-pulse operation of ArF lasers for 193-nm microlithography

Thomas Hofmann, Bruce Johanson, Palash P. Das

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389039
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The phenomenon of compaction of fused silica is a major concern in 193nm lithography. Numerous studies have shown that as a result, the cost-of-operation of 193nm lithography is expected to be significantly higher than at 248nm due to the degradation of scanner optics. Recent studies have also shown that compact could be reduced by increasing the pulse length of the ArF laser since the magnitude of compaction reduced as 1/(Tis)^0.6. Here, Tis is the integral square pulse duration and is given.

Citation Download Citation

Thomas Hofmann, Bruce Johanson, and Palash P. Das "Prospects for long-pulse operation of ArF lasers for 193-nm microlithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389039

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