Microprocessor technology challenges through the next decade

George E. Sery

doi:10.1117/12.324407

27 August 1998 Microprocessor technology challenges through the next decade

George E. Sery

Proceedings Volume 3509, In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II; (1998) https://doi.org/10.1117/12.324407
Event: Microelectronic Manufacturing, 1998, Santa Clara, CA, United States

Abstract

Historical microprocessor product trends show an increase in product frequency of 1.25x per year and a transistor count increase of 1.4x per year since the early 70's. This trend is forecast to continue over the next decade to the 0.07 micrometers generation. To support the trend, challenges in lithography, transistor definition, interconnect system, and manufacturability must be overcome. Solutions to the lithography challenge, will require successful implementation of 157nm optical or next generation lithography. The transistor solution will require integration of sub 2.0nm gate oxides with improved gate electrode materials, improved low resistance shallow source- drain technology, advanced channel dopant engineering, and operation at or below 1.0v. Interconnect challenges will require support of 10 or more interconnect layers using low resistivity metallization and reduce epsilon dielectric. Manufacturing challenges require support of larger die sizes, integrated at higher technology complexity, while maintaining lowest possible cost.

Citation Download Citation

George E. Sery "Microprocessor technology challenges through the next decade", Proc. SPIE 3509, In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II, (27 August 1998); https://doi.org/10.1117/12.324407

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