Dissolution-rate analysis of ArF resist polymers based on the percolation model

Atsuko Yamaguchi; Shinji Kishimura; Nobuyuki N. Matsuzawa; Takeshi Ohfuji; Tomoaki Tanaka; Seiichi Tagawa; Masaru Sasago

doi:10.1117/12.312365

29 June 1998 Dissolution-rate analysis of ArF resist polymers based on the percolation model

Atsuko Yamaguchi, Shinji Kishimura, Nobuyuki N. Matsuzawa, Takeshi Ohfuji, Tomoaki Tanaka, Seiichi Tagawa, Masaru Sasago

Author Affiliations +

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312365
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

We investigated the dissolution properties of methacrylate polymers to study the development mechanism of chemically amplified resists. We measured the dissolution rate of methacrylate copolymers as a function of the hydrophilic unit content, and simulated dissolution phenomena based on percolation theory. The dissolution rate curves we obtained had strong nonlinear dependence on hydrophilic unit content. In the simulation analysis, base molecule diffusion through the hydrophilic path was modeled as particle diffusion through the percolation field. The diffusion constant was calculated based on conventional and modified diffusion models. The width of the diffusion path is not considered in a conventional model. We suggested a new variable to describe diffusion path width in the modified model. The simulation results indicated that our model reproduced the experimental results better than the conventional model.

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Atsuko Yamaguchi, Shinji Kishimura, Nobuyuki N. Matsuzawa, Takeshi Ohfuji, Tomoaki Tanaka, Seiichi Tagawa, and Masaru Sasago "Dissolution-rate analysis of ArF resist polymers based on the percolation model", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312365

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