Paper
14 May 2004 Material origins of line-edge roughness: Monte Carlo simulations and scaling analysis
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Abstract
A fast 2D/3D resist dissolution algorithm is used to quantify line-edge roughness and determine its relation to resist material parameters, such as the polymerization length distribution, the end-to-end distance and the radius of gyration, along with the effects of acid-diffusion. The same relation between surface roughness and exposure dose known to hold experimentally is also shown to be valid for line-edge roughness. Increasing average polymerization length results in increased values of line-edge roughness, radius of gyration and end-to-end distance establishing an immediate relation between material properties and measured line-edge roughness (LER). The effects of the edge depth and length of measurement and of the free volume on LER vs. are also investigated.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
George P. Patsis, Vassilios Constantoudis, and Evangelos Gogolides "Material origins of line-edge roughness: Monte Carlo simulations and scaling analysis", Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); https://doi.org/10.1117/12.535202
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Cited by 2 scholarly publications.
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KEYWORDS
Line edge roughness

Polymerization

Diffusion

Monte Carlo methods

Ionization

Polymers

Roentgenium

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