Paper
5 June 1998 Multilayer coating and tests of a 10x extreme-ultraviolet lithographic camera
Eberhard Adolf Spiller, Frank J. Weber, Claude Montcalm, Sherry L. Baker, Eric M. Gullikson, James H. Underwood
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Abstract
A new set of mirrors for the SANDIA 10X microstepper has been fabricated. The optics have been tested by optical profilometry, atomic force microscopy, EUV reflectometry and EUV scattering. THese measurements allow one to predict the performance of the camera. Mo/Si multilayer coatings with the required thickness profile were produced by DC magnetron sputtering using shadow masks in front of the rotating substrates. The figure errors of the new mirrors are considerably smaller than those obtained previously, while mid-spatial frequency roughness still needs improvement. This roughness reduces mostly the throughput of the system; i.e. most of the scattered light occurs outside the field of the camera and there is only a small reduction of contrast or resolution.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eberhard Adolf Spiller, Frank J. Weber, Claude Montcalm, Sherry L. Baker, Eric M. Gullikson, and James H. Underwood "Multilayer coating and tests of a 10x extreme-ultraviolet lithographic camera", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309617
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Cited by 5 scholarly publications.
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KEYWORDS
Mirrors

Coating

Reflectivity

Cameras

Multilayers

Scattering

Extreme ultraviolet

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