Scattering from normal-incidence EUV optics

Eric M. Gullikson

doi:10.1117/12.309625

5 June 1998 Scattering from normal-incidence EUV optics

Eric M. Gullikson

Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309625
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Measurements of nonspecular EUV scattering from Mo/Si multilayer coated mirrors have been performed. The surface power spectral density is deduced from the angular scattering distribution and in all cases is found to be in excellent agreement with surface profile measurements, by both optical and atomic force microscopy. It is demonstrated that the effects of scatter on the EUV imaging performance of a single normal incidence optic are accurately predicted from surface profile measurements.

Citation Download Citation

Eric M. Gullikson "Scattering from normal-incidence EUV optics", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309625

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available