Koehler-illumination-based method to improve beam size controllability

Kiyoshi Hattori; Hitoshi Sunaoshi; Atsushi Ando

doi:10.1117/12.309606

5 June 1998 Koehler-illumination-based method to improve beam size controllability

Kiyoshi Hattori, Hitoshi Sunaoshi, Atsushi Ando

Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309606
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

We have developed a new EB calibration method for adjusting both Koehler illumination condition and beam current density precisely in the EB direct writing system EX-8D. Koehler illumination condition is adjusted by controlling the condenser lens so that the beam size change on the target vs. focus change of the objective is minimized. Beam current density is adjusted to the desired value by controlling the two condenser lenses which acts as a zoom lens function and maintaining above Koehler illumination condition. Using this method, beam size deviation was improved to less than 2 nm for a focus change of 10 micrometers , and beam current density was controlled to less than 0.5 percent error from the desired value. This beam calibration was executed in less than 10 minutes. We have also evaluated the pattern roughness and the pattern size deviation depending on the focus change by delineating a 0.125 micrometers line and space pattern. The pattern roughness was controlled to less than 2 nm and the pattern size deviation was less than 2 nm for a focus change of +/- micrometers .

Citation Download Citation

Kiyoshi Hattori, Hitoshi Sunaoshi, and Atsushi Ando "Koehler-illumination-based method to improve beam size controllability", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309606

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