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12 February 1997 Edge-placement accuracy of opaque and clear defect repairs using focused ion beam technology
Mark L. Raphaelian, Don Carolan, J. David Casey Jr., Andrew F. Doyle, M. F. Ellis, David C. Ferranti, Joshua Lessing, K. Rose, Diane K. Stewart, Roy L. White
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Proceedings Volume 3236, 17th Annual BACUS Symposium on Photomask Technology and Management; (1997) https://doi.org/10.1117/12.301220
Event: 17th Annual BACUS Photomask Technology and Management, 1997, Redwood City, CA, United States
Abstract
On the standard Micrion 8000 PM Repair System platform, the repair accuracy for clear defect repair and opaque defect repair is plus or minus 75 nm. Incorporation of a new ion beam column has pushed the repair accuracy for clear and opaque defect repairs to smaller values. This new system can image isolated defects less than 200 nm in size. To characterize the repair accuracy of the system, experiments on edge placement accuracy were performed. This paper presents data on the accuracy of defect repairs using the Micrion 8000 PSM Repair System on Chrome masks. The study specifically looks at the edge placement of opaque defect and clear defect repairs on masks coated with a conductive layer versus masks not coated with a conductive layer. We also explore the edge placement accuracy of the repair due to the directionality of the repair scan. Finally we examine the shape of the distribution function of the repair measurements and also investigate differences in the measured edge placement accuracy of repairs using different measuring techniques.
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Mark L. Raphaelian, Don Carolan, J. David Casey Jr., Andrew F. Doyle, M. F. Ellis, David C. Ferranti, Joshua Lessing, K. Rose, Diane K. Stewart, and Roy L. White "Edge-placement accuracy of opaque and clear defect repairs using focused ion beam technology", Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); https://doi.org/10.1117/12.301220
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KEYWORDS
Photomasks
Carbon
Opacity
Calibration
Ion beams
Statistical analysis
Phase shifting
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