Use of highly absorptive azo dyes in photoresist coatings

Ping-Hung Lu; Shuji Ding; T. T. Hannigan; D. E. Eberly; Elaine Kokinda; Sunit S. Dixit; Salem Mehtsun; Anthony J. Corso; Dinesh N. Khanna

doi:10.1117/12.275880

7 July 1997 Use of highly absorptive azo dyes in photoresist coatings

Ping-Hung Lu, Shuji Ding, T. T. Hannigan, D. E. Eberly, Elaine Kokinda, Sunit S. Dixit, Salem Mehtsun, Anthony J. Corso, Dinesh N. Khanna

Author Affiliations +

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275880
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

We recently synthesized and studied a number of highly absorptive diketo azo dyes. These materials, existed in the hydrazo tautomeric forms, showed high extinction coefficients, typically (epsilon) approximately equals 25,000 - 39,000 at 365 nm. They also exhibited good solubility in common resist casting solvents such as propylene glycol monoethyl acetate (PGMEA) and ethyl lactate. The thermostability of the materials was investigated. The impact of these diketo azo dyes on i-line resist performance in terms of swing reduction, reflective notching control and lithographic performance is discussed.

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Ping-Hung Lu, Shuji Ding, T. T. Hannigan, D. E. Eberly, Elaine Kokinda, Sunit S. Dixit, Salem Mehtsun, Anthony J. Corso, and Dinesh N. Khanna "Use of highly absorptive azo dyes in photoresist coatings", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275880

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