Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers

Cheol-Kyu Bok; Cha-Won Koh; Min-Ho Jung; Ki-Ho Baik; Jin-Baek Kim; Jong-Ho Cheong

doi:10.1117/12.275852

7 July 1997 Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers

Cheol-Kyu Bok, Cha-Won Koh, Min-Ho Jung, Ki-Ho Baik, Jin-Baek Kim, Jong-Ho Cheong

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275852
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

In this paper we report here on lithographic performance of high resolution, environmentally stable and aqueous base developable positive tone resist for DUV lithography. There have been a lot of efforts to prevent the resist from suffering from the deactivation of acid during the delay time between exposure and post exposure bake (PEB). The new design of matrix resin containing amide functional group has advantages over current lithographic techniques. The effects of amide functional group as a basic additive in a chemically amplified resist was investigated. A new class of matrix resin containing amide functional group, poly(hydroxystyrene-co-t- butyl acrylate-co-3-(t-butoxycarbonyl)-1-vinyl-2-caprolactam), was developed. It showed 0.20 micrometer lines/spaces patterns of this resist using KrF excimer stepper (NA 0.55, partial coherence factor 0.55) with an exposure dose of 25 mJ/cm². This resist showed no change of pattern profile after 2 hours post exposure delay in which ammonia concentration is 5 ppb. 3-(t-butoxycarbonyl)-1-vinyl-2-caprolatam (BCVC) unit as a basic additive can not only solve amine contamination effectively, but also improve the resolution of the resist. BCVC unit reduces the diffusion of acid and it results in sharp contrast at the interface between the exposed and unexposed areas. Therefore, adding BCVC unit in matrix resin leads to the stabilization of the pattern profile and higher resolution.

Citation Download Citation

Cheol-Kyu Bok, Cha-Won Koh, Min-Ho Jung, Ki-Ho Baik, Jin-Baek Kim, and Jong-Ho Cheong "Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275852

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available