Evaluation of phase and transmittance error on deep-UV halftone phase-shift mask

Suigen Kyoh; Hideaki Sakurai; Takayuki Iwamatsu; Akiko Yamada; Iwao Higashikawa

doi:10.1117/12.245248

24 July 1996 Evaluation of phase and transmittance error on deep-UV halftone phase-shift mask

Suigen Kyoh, Hideaki Sakurai, Takayuki Iwamatsu, Akiko Yamada, Iwao Higashikawa

Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245248
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan

Abstract

The effect of phase shift and transmittance fluctuation in a mask plate have been studied. The differences of these optical properties of halftone phase shift masks result in critical dimension(CD) error on a wafer so that these fluctuation in a plate reduce the process window across the exposure field. In considering CD error budget, such factors as phase shift and transmittance has to be taken into account. To estimate this budget, a set of test masks were fabricated, in which phase shift and transmittance are varied, and the exposures using these masks under the same conditions were performed.

Citation Download Citation

Suigen Kyoh, Hideaki Sakurai, Takayuki Iwamatsu, Akiko Yamada, and Iwao Higashikawa "Evaluation of phase and transmittance error on deep-UV halftone phase-shift mask", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245248

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