Process improvement and cost reduction utilizing a fully automated CD SEM for thin film head pole 2 resist measurements

Paul C. Knutrud; Robert M. Newcomb

doi:10.1117/12.240132

21 May 1996 Process improvement and cost reduction utilizing a fully automated CD SEM for thin film head pole 2 resist measurements

Paul C. Knutrud, Robert M. Newcomb

Author Affiliations +

Proceedings Volume 2725, Metrology, Inspection, and Process Control for Microlithography X; (1996) https://doi.org/10.1117/12.240132
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Thin film head (TFH) manufacturers are constantly striving to improve process control, eliminate scrap material and reduce the total cost of manufacturing their devices. Successful measurement and control of the Pole 2 Resist structure is a critical component of the TFH process which directly impacts disk drive performance, reliability and final product cost. Until recently, white light optical metrology systems have been the only option for measuring the Pole 2 structures. However, recent advances in TFH process technology have resulted in aspect ratios up to 10:1 which has limited the ability of the white light optical metrology systems. IVS has developed a unique metrology solution to image and measure these high aspect ratio structures utilizing the IVS-200^TM CD SEM. This technology provides state of the art measurement performance for repeatability and stability which in turn has provided manufacturers with the ability to monitor the Pole 2 process and reap both technical and financial benefits.

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Paul C. Knutrud and Robert M. Newcomb "Process improvement and cost reduction utilizing a fully automated CD SEM for thin film head pole 2 resist measurements", Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); https://doi.org/10.1117/12.240132

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KEYWORDS

Scanning electron microscopy

Manufacturing

Photoresist processing

Metrology

Throat

Head

Critical dimension metrology

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