Paper
10 January 1996 Point-to-point UV-written planar waveguide components
Karin Zenth, Christian V. Poulsen, Anders Bjarklev
Author Affiliations +
Abstract
Germanosilicate film waveguides have been fabricated by plasma enhanced chemical vapor deposition. In the film waveguides straight waveguides, directional couplers and a Y-splitter were written directly point to point with UV-light by focussing a 244 nm beam by a single lens. No kind of mask was used to define the structure. The propagation loss of a multi-mode UV-written waveguide has been measured to 0.3 dB/cm, which is excellent for directly written waveguides. The UV-induced change of refractive index in the written components is estimated to be between 4 (DOT) 10-3 and 6 (DOT) 10-3. This provides a highly flexible and fast method for fabrication of new waveguide components.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Karin Zenth, Christian V. Poulsen, and Anders Bjarklev "Point-to-point UV-written planar waveguide components", Proc. SPIE 2695, Functional Photonic and Fiber Devices, (10 January 1996); https://doi.org/10.1117/12.229935
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KEYWORDS
Waveguides

Refractive index

Directional couplers

Plasma enhanced chemical vapor deposition

Hydrogen

Wave propagation

Thin films

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