Schwarzschild microscope at the wavelength of 18 nm using a laser-produced plasma source

Zhanshan Wang; Jianlin Cao; Bo Chen; Yueying Ma; Junping Zhang; Xingdan Chen

doi:10.1117/12.212619

20 June 1995 Schwarzschild microscope at the wavelength of 18 nm using a laser-produced plasma source

Zhanshan Wang, Jianlin Cao, Bo Chen, Yueying Ma, Junping Zhang, Xingdan Chen

Proceedings Volume 2515, X-Ray and Extreme Ultraviolet Optics; (1995) https://doi.org/10.1117/12.212619
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

The design , construction and imaging experiments of a soft X-ray microscope which consists of acompact laser-produced plasma source (LPPS) , as well as a multilayer coated spherical condenser, and Schwarzschild optics are presented. The Schwarzschild optics was designed for numerical aperture of 0. 1 and magnification of 10. For the working wavelength of 18 nm calculations show that the resolution is expected to be 0.2im. We designed a 41 layer Mo/Si multilayer coatings of throughput centered at l8nm, and these coatings were deposited by magnetron sputtering. We put a Al/C multilayer filter in front of the image to block thelong wavelength radiation. The object on the primary experiments is a piece of Cu mesh of 55 pair lines/mm witha opening of 5m and bar width of 3im. The backlit mesh image were taken on Kodak X-ray film. The first lot of experiment data show that a spatial resolution better than 1im was obtained. Key words : Schwarzschild Optics , Soft X-Ray Microscope , Multilayer mirrors.

Citation Download Citation

Zhanshan Wang, Jianlin Cao, Bo Chen, Yueying Ma, Junping Zhang, and Xingdan Chen "Schwarzschild microscope at the wavelength of 18 nm using a laser-produced plasma source", Proc. SPIE 2515, X-Ray and Extreme Ultraviolet Optics, (20 June 1995); https://doi.org/10.1117/12.212619

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